產(chǎn)品分類
臥式爐
所屬分類:
氧化/擴(kuò)散/退火
概要:
該設(shè)備是半導(dǎo)體生產(chǎn)線前工序的重要工藝設(shè)備之一,用于大規(guī)模集成電路、 分立器件、電力電子、光電器件等行業(yè)的氧化、擴(kuò)散、退火、合金等工藝。 氧化工藝:主要用于初始氧化層、柵氧化層、場氧化層等多種氧化介質(zhì)層的制備工藝。
關(guān)鍵詞:
臥式爐
臥式爐
產(chǎn)品概述/Product Introduction:
該設(shè)備是半導(dǎo)體生產(chǎn)線前工序的重要工藝設(shè)備之一,用于大規(guī)模集成電路、 分立器件、電力電子、光電器件等行業(yè)的氧化、擴(kuò)散、退火、合金等工藝。
This equipment is one of the important process equipment in the pre production process of semiconductor production lines, used for oxidation, diffusion, annealing, alloy and other processes in industries such as large-scale integrated circuits, discrete devices, power electronics, optoelectronic devices, etc.
氧化工藝:主要用于初始氧化層、柵氧化層、場氧化層等多種氧化介質(zhì)層的制備工藝。
Oxidation process: mainly used for the preparation of various oxide dielectric layers such as initial oxide layer, gate oxide layer, field oxide layer, etc.
產(chǎn)品特點(diǎn)/Product Characteristics:
♦高潔凈度:包括材料、工藝環(huán)境等 High cleanliness: including materials, process environment, etc
♦高精度:包括爐內(nèi)溫度、進(jìn)氣流量、排氣壓力、運(yùn)動(dòng)控制等 High precision: including furnace temperature, inlet flow, exhaust pressure, motion control, etc
♦高安全性:包括氣體泄漏檢測、氣流檢測、人機(jī)互鎖等 High safety: including gas leakage detection, airflow detection, man-machine interlocking, etc
技術(shù)指標(biāo)/Technical Indicators:
♦晶片尺寸:6/8/12英寸 Wafer size: 6/8/12 inch
♦制程溫度范圍:300°C-1250°C Process temperature range: 300°C-1250°C
♦批次片數(shù): 100-150片 Batch capacity: 100-150 pcs
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